【摘要】 采用射频磁控溅射ZnO陶瓷靶、直流磁控溅射Ag靶的方法制备了不同厚度Ag夹层的ZnO(60nm)/Ag/ZnO(60nm)多层膜.分别用X射线衍射仪、紫外可见分光光度计、四探针测试仪对样品的结构、光学性质、电学性质进行了研究.结果表明:随着Ag层厚度的增加,ZnO/Ag/ZnO多层膜呈现多晶结构,Ag(111)衍射峰的强度增强.Ag夹层厚度为11nm时,ZnO(60nm)/Ag/ZnO(60nm)膜在554nm处的透过率高达92.3%.随着Ag层厚度的增加,Ag膜的特征吸收峰呈现红移和宽化,ZnO/Ag/ZnO多层膜的面电阻先减小后趋于稳定.更多还原

【Abstract】 ZnO(60nm)/Ag/ZnO(60nm) multilayer films with different Ag thicknesses were prepared by alternate RF magnetron sputtering of ZnO and DC magnetron sputtering of Ag.The structural,optical,and electrical properties of samples were studied with an X-ray diffractometer,a UV-vis spectrophotometer,and a four-point probe,respectively.The results indicate that increasing the thickness of the Ag layer enhances the polycrystalline structure of the ZnO(60nm)/Ag/ZnO(60nm) and the intensity of the Ag(111) peak.When the thickness of the Ag film is 11nm,the ZnO(60nm)/Ag/ZnO(60nm) film has a high optical transmittance of 92.3% at 554nm.As the thickness of the Ag film increases,red shift and broadening effects of the characteristic absorption peak of Ag occur,and the sheet resistance of the multilayer film decreases and then levels off to a steady value.更多还原