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栅压对LDMOS在瞬态大电流下工作的温度影响

Influence of Gate Voltages on Temperature of LDMOS Under Ultra-High Transient Currents

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【作者】 李梅芝; 陈星弼;

【Author】 Li Meizhi and Chen Xingbi (School of Microelectronics and Solid-State Electronics,University of Electronic Science and Technology of China,Chengdu 610054,China)

【机构】 电子科技大学微电子与固体电子学院; 电子科技大学微电子与固体电子学院 成都610054; 成都610054;

【摘要】 研究LDMOS在一次雪崩击穿后的大电流区,栅压对器件内部温度的影响.结果表明:温度随正栅压升高而升高,随负栅压升高而降低,并分析了有源区内电场强度、电流密度和功率密度随栅压的变化规律.从而证明,与LDMOS栅接地时相比,正栅压降低了器件的静电放电能力,而负栅压则提高了器件的静电放电能力.

【Abstract】 The influence of gate voltages on the temperature of LDMOS under ultra-high transient currents is studied.The results show that in comparison with gate-grounded conditions,the temperature in the device rises when the gate voltages are positive,and the temperature falls when the gate voltages are negative.The distributions of the electric fields,conduction currents,and dissipated power densities under different gate voltages are also investigated.It is proved that positive gate voltages weaken the electro-static discharge capability of LDMOS,and negative gate voltages enhance it.These results can be used as a reference for the reliability of power devices.

【关键词】 栅压; 温度; 功率密度;
【Key words】 gate voltages; temperature; dissipated power densities;
【基金】 国家自然科学基金资助项目(批准号:60476036)~~
  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,2007年08期
  • 【分类号】TN386.1
  • 【被引频次】5
  • 【下载频次】171
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