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ECR-PEMOCVD技术生长的GaMnN薄膜的特性
Characteristics of GaMnN Film Grown by ECR-PEMOCVD
【摘要】 利用电子回旋共振-等离子体增强金属有机物化学气相沉积(ECR-PEMOCVD)技术,在蓝宝石(α-Al2O3)衬底上生长出具有一定Mn含量的GaMnN稀磁半导体薄膜.RHEED图像呈现清晰的斑点状点阵,表明薄膜为单晶,表面不是很平整,为三维岛状生长模式.X射线衍射分析表明薄膜为六方结构,沿c轴方向生长,结晶性良好.AFM显示薄膜是由许多亚微米量级的晶粒按一致的取向规则堆砌而成的.超导量子干涉仪(SQUID)测量显示在室温下薄膜依然具有铁磁性,居里温度约为400K.
【Abstract】 DMS GaMnN film with a certain concentration of Mn and good crystal qualities was successfully grown on sapphire substrate (α-Al2O3) by ECR-PEMOCVD.The RHEED graphs present a clear spot-like lattice and a surface that is not very smooth,indicating that the GaMnN film is single crystalline and its growth mode was three-dimensional island.XRD analysis shows that the film has a hexagonal structure with c-axis orientation and very good crystallinity.The AFM test result shows that the GaMnN films are composed of many submicron grains with the same orientation.Superconducting quantum interference device (SQUID) measurement shows apparent ferromagnetism at room temperature,and the Curie temperature of the film is about 400K.
【Key words】 ECR-PEMOCVD; DMS; GaMnN; ferromagnetism at room temperature; Curie temperature;
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,2007年07期
- 【分类号】TN304.05
- 【被引频次】2
- 【下载频次】118