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纳米级工艺制程仿真SenTaurus Process的应用
Application of Nano-Level Integrated Process Simulation Tool SenTaurus Process
【摘要】 基于Synopsys Inc.最新推出的新一代nm级IC制程工艺设计工具--SenTaurus Process,实现了CMOS架构的nm级NMOS制程的工艺级可制造性设计。仿真结果体现了SenTaurus Process的强大功能和使用SenTaurus Process进行工艺级可制造性设计的必要性。
【Abstract】 Based on the elementary functions of the new generation nano-level IC process design tool:SenTaurus Process issued recently by Synopsys Inc,nano-level NMOS process level DFM based on CMOS framework was realized. Simulated results reveal the powerful functions of SenTaurus Process and the necessity of technology-level design for manufacturing using SenTaurus Process.
【关键词】 集成电路;
纳米层次;
工艺仿真;
可制造性设计;
【Key words】 IC; nano-level; process simulation; design for manufacturing(DFM);
【Key words】 IC; nano-level; process simulation; design for manufacturing(DFM);
- 【文献出处】 微纳电子技术 ,Micronanoelectronic Technology , 编辑部邮箱 ,2007年06期
- 【分类号】TN405
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