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惰性气体热压法制备W/Ti合金靶材研究
Preparation of W-Ti Sputtering Targets under Inert Atmosphere
【摘要】 用W粉和Ti粉作原料,采用惰性气体热压法制备W/Ti合金靶材。研究了靶材致密性、富Ti的β相含量、微观结构均匀性与工艺条件的关系。结果表明,控制温度在1250~1450℃之间,压力在20 MPa左右,保温时间在30 min左右可制备高性能的W/Ti合金靶材。
【Abstract】 W-Ti targets were fabricated by inert gas hot press method.The target characteristics including relative density,microstructure,content of Ti rich β phase were introduced.The relationship between target characteristic and technical conditions was researched.The results show that under the condition of temperature range of 1250~1450 ℃,hot press about 20 MPa and heat preservation time about 30 min,good quality target can be fabricated.
【关键词】 溅射靶材;
W/Ti合金靶材;
扩散阻挡层;
热压;
【Key words】 sputtering target; W-Ti alloy target; diffusion barrier layers; hot press;
【Key words】 sputtering target; W-Ti alloy target; diffusion barrier layers; hot press;
【基金】 国家自然科学基金资助项目(50501003);国家科技攻关资助项目(2004DFBA0003)
- 【文献出处】 稀有金属 ,Chinese Journal of Rare Metals , 编辑部邮箱 ,2006年05期
- 【分类号】TF124.3
- 【被引频次】26
- 【下载频次】348