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ZnxMg1-xS多晶薄膜的制备及其特性研究
Preparation and characteristics of ZnxMg1-xS polycrystalline thin films
【摘要】 采用真空蒸镀技术,在普通石英玻璃衬底上成功制备出固溶体ZnxM g1-xS多晶薄膜。用X射线能量色散谱仪、原子力显微镜、X射线衍射仪、紫外-可见分光光度计等对薄膜晶体成分、表面形貌、结构和光学性质做了分析。结果表明:当x=0.9时,固溶体ZnxM g1-xS晶体形貌生长和结晶性良好,为闪锌矿结构;由于镁成分的掺入,ZnxM g1-xS薄膜的(111)峰位相对于ZnS的(111)峰位向大角度方向移动0.14;°光学吸收边相对于ZnS产生了明显的蓝移,其禁带宽度增加0.19 eV,显示了作为短波光电器件材料和紫外探测材料的应用潜力。
【Abstract】 Solid-soluble polycrystalline ZnxMg1-xS thin films were deposited on amorphous quartz glass substrates by vacuum evaporation,and their characteristics were investigated by AFM,XRD,EDS and UV-visible absorption spectrum.The final morphology indicated that the Zn0.9Mg0.1S thin film is uniformly coated and its crystallization is of zinc-blende structure.The(111) peak will move slightly at a big angle due to Mg addition.The absorption band edge of Zn0.9Mg0.1S is obviously blue shifted relative to ZnS.The result indicated that ZnxMg1-xS is a promising materials for the short wavelength optoelectronic applications.
【Key words】 ZnxMg1-xS polycrystalline thin film; vacuum evaporation coating; ultraviolet absorption;
- 【文献出处】 真空 ,Vacuum , 编辑部邮箱 ,2006年01期
- 【分类号】O484.1
- 【下载频次】78