【摘要】 研究电沉积钴镍铁合金工艺条件如电流密度、pH和温度以及镀层厚度对膜层性能的影响。用振动样品磁强计测试膜层的矫顽力Hc、磁化强度Ms及磁滞回线,用高频电感法测试膜层的磁导率μi,用四探针法测试膜层的电阻率ρ。结果表明,膜层的电磁性能与镀覆工艺条件相关,在最佳镀覆工艺条件下(电流密度10mA/cm2,pH=2.8,施镀温度25℃,时间10min)所得合金镀层光亮、致密,有较好电磁特性,Bs达1.9T,矫顽力Hc为1.15Oe,电阻率为45μΩ.cm,在1MHz下磁导率μi为602。更多还原

【Abstract】 The effect of the plating conditions such as the density of electricity,pH value and plating temperature as well as the thickness of the films on the properties of CoNiFe alloy films are investigated.The magnetic properties such as H_c,M_s(B_s) and hysteresis loops are measured by VSM,and the specific resistance ρ is measured by four-probe methods.The results show that the magnetic properties of the film are related to the plating condition.A smooth and compact CoNiFe film with thickness of 1.16 μm and relative high magnetic properties can be obtained at the optimal plating condition(current density 10mA/cm~2,pH=2.8,temperature 25℃,retention time 10min),the performance of the film is excellent,for example,H_c=1.15Oe,B_s is up to 1.9T,and ρ=45μΩ·cm and μ_i is 602 under the frequency of 1MHz.更多还原