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Ni+注入BiB3O6晶体光波导的折射率分布
The Refractive Index Profile of the Optical Waveguide Formed by MeV Ni+ Ion Implantation into BiB3O6 Crystal
【摘要】 在室温下,采用BiB3O6晶体,切向沿着(111)晶面方向制成大小为6 mm×8 mm×1.5 mm晶体样品。首次采用能量3.0 MeV、剂量为1×1014ions/cm2的Ni+注入到BiB3O6样品的抛光面,形成平面光波导。注入过程中,样品表面法线方向与入射离子束方向成7°角。采用的氦氖激光器的工作波长为632.8 nm,用棱镜耦合法观察波导的暗模特性,测量每个导模的有效折射率。
【Abstract】 Planar optical waveguide was first formed in BiB3O6 sample by 3.0 MeV Ni+ ion implantation with a dose of 1×1014 ions/cm2 at room temperature.The sample crystal used in this experiment was with a size of(6 mm×)8 mm×1.5 mm and it was cut along (111) plane and optically polished.The sample was tilted by 7° off the beam direction during the ion implantation.A laser beam with 632.8 nm from a He-Ne laser was used in the measurement.The dark modes were observed by prism coupling method.The refractive index profile of the BiB3O6 waveguide was simulated using reflectivity calculation method.
- 【文献出处】 压电与声光 ,Piezoelectrics & Acoustooptics , 编辑部邮箱 ,2006年04期
- 【分类号】TN252
- 【下载频次】55