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羟基磷灰石义眼台植入后暴露原因分析及处理

Analysis on the causes and management of exposure of orbital hydroxyapatite implants

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【作者】 聂玉红邢怡桥郭颖朱晶

【Author】 NIE Yu-Hong,XING Yi-Qiao,GUO Ying,ZHU Jing From the Department of Ophthalmology,Renmin Hospital of Wuhan University,Wuhan 430060,Hubei Province,China

【机构】 武汉大学人民医院眼科武汉大学人民医院眼科

【摘要】 目的探讨羟基磷灰石义眼台植入后义眼台暴露的原因及处理方法。方法对本院2002~2004年收治的32眼羟基磷灰石义眼台暴露患者的治疗方法及效果进行回顾性分析。结果义眼台暴露的发生时间为术后3d~6月,暴露范围为3~14mm,义眼台暴露能自行愈合者5眼;手术修补27眼,其中2眼伴有慢性感染最终手术取出义眼台。术后随访。结论义眼台暴露的原因与炎症、手术方法、手术时机、术后感染和义眼台的型号等因素有关。其处理可根据暴露范围不同采用不同方法,义眼台暴露范围在5mm以内的可采用保守治疗,暴露范围超过10mm的应尽早手术修补,处理过程中应尽量消除可能再次引起义眼台暴露的危险因素。

【Abstract】 Objective To discuss the causes and managements of exposure of the hydroxyapatite (HA) implants.Methods A retrospective analysis of 32 cases with HA implant exposure between 2002 and 2004 was couducted.Results The implant exposure occurred 3 days to 6 months after implantation.The diameters of exposure were 3~14 mm.Five eyes with implant exposure were managed conservatively and the conjunctival dehiscence healed spontaneously,and 27 eyes were managed by operation,of which 2 eyes with chronic infection of the implants received removal of the implants.Follow-up was performed after operation.Conclusion The reasons of exposure of the HA implants are related with inflammation,surgery method,surgery opportunity,postoperative infection and the version of HA,and so on.Different methods may be applied to manage HA implant exposure according to the sizes of exposure.Small defects(≤5 mm)may be treated conservatively and larger defects(>10 mm) should be active management as early as possible.During the course of surgery,we should eliminate the risk factors of HA implant exposure as soon as possible.

【关键词】 羟基磷灰石义眼台暴露原因处理
【Key words】 orbital hydroxyapatite implantexposurecausesmanagement
  • 【文献出处】 眼科新进展 ,Recent Advances in Ophthalmology , 编辑部邮箱 ,2006年09期
  • 【分类号】R779.64
  • 【被引频次】42
  • 【下载频次】132
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