【摘要】 从高分子辐射化学的角度分析了电子束曝光的实际反应机理,推导得出曝光辐射剂量与辐射降解程度间的关系,提出了重复增量扫描方式的电子束微三维加工方法。通过在SDS-3型电子束曝光机上对正性抗蚀剂PMMA进行曝光实验,显影后得到轮廓清晰的三维结构,验证了该方法的可行性。更多还原

【Abstract】 The practical reaction mechanism of electron beam lithography is analyzed based on macromolecule radiation chemistry and the relationship of the exposure radiation dose with radiation scission degree is deduced.Then the overlapped increment scanning is proposed as a new method of three-dimensional microfabrication.The exposure experiments are made in SDS-3 electron beam lithography system.After the development,the clear three-dimensional microstructures are obtained.So this method can be used in the three-dimensional microfabrication.更多还原