节点文献
EUV光刻中激光等离子体光源的发展
Development of Laser Produced Plasma Source for EUV Lithography
【摘要】 简述了获得极紫外光源的途径,系统介绍了激光等离子体(LPP)光源的发展历程,对当前Cymer公司研制的极紫外光刻设备所需LPP光源的最新研究进展做了详细阐述,最后对光源的整体发展给予了总结和展望。
【Abstract】 The production of Extreme Ultraviolet(EUV) was introduced.Simultaneously,the development of the laser produced plasma(LPP) sources was systemically described and the last development of Cymer’s LPP sources for EUV Lithography was reviewed in detail.Finally,a summary was given and some prospects for EUV source research were proposed.
【关键词】 极紫外光刻;
激光等离子体;
极紫外光功率;
碎片污染;
【Key words】 EUV lithography; LPP; EUV power; debris contamination;
【Key words】 EUV lithography; LPP; EUV power; debris contamination;
【基金】 863IC装备专项资助;国家重点基础研究发展计划(973计划)资助项目(2003CB716204)
- 【文献出处】 微细加工技术 ,Microfabrication Technology , 编辑部邮箱 ,2006年05期
- 【分类号】TN405;TN249
- 【被引频次】19
- 【下载频次】601