【摘要】 由于浸没液体和大数值孔径的引入,杂散光对光刻性能的影响更为显著和复杂,对杂散光进行分析和控制是获得良好光刻性能的关键之一。利用Prolith 9.0软件研究了不同数值孔径(NA)条件下,浸没式ArF光刻中杂散光对65 nm特征图形的光强分布、图像对比度、线宽均匀性、图形位置误差和工艺窗口的影响,研究结果表明,大数值孔径会导致光刻性能对杂散光更为敏感。同时还分析了偏振方向与曝光图形方向一致(Y偏振)的线偏振光对不同杂散光和数值孔径条件下的光刻工艺窗口的影响,研究结果表明,采用Y偏振光可以降低杂散光对工艺窗口的影响,使工艺窗口得到相应拓展,提高了光刻性能。更多还原

【Abstract】 With the immersion liquid and hyper NA being adopted,the impact of flare on lithography performances is crucial and tangle-some.To analyze and control the flare is a critical technology to achieve good lithography performances.When 65 nm features are printed in ArF immersion lithography,the variation of light intensity,image contrast,CD uniformity,pattern-placement error and process window result from different numerical apertures(NA) and flare is calculated using the commercial software Prolith 9.0.The results show that the hyper NA enhances the impact of flare on lithography performances.The impact of Y polarized light(the polarized direction is consistent with the line feature) on process window with different flare and numeric aperture(NA) were analyzed.The results show that the process window can be extended by making use of the Y polarized light,and the impact of flare on process window also can be reduced with using Y polarized light.更多还原