【摘要】 利用射频反应磁控溅射方法,制备了调制比约为4,调制周期不同的一系列TiN/ZrN纳米多层膜.利用X射线衍射仪(XRD)、高分辨电子显微镜(HRTEM)和纳米压痕仪(Nanoindentation)对多层膜的调制结构、界面状态和力学性能进行了表征.研究结果表明TiN/ZrN多层膜具有很好的调制结构,但是在TiN层和ZrN层之间存在一定厚度的界面混合层.力学性能分析表明:当调制周期小于15nm时,TiN/ZrN多层膜的硬度介于单一TiN和ZrN薄膜的硬度之间;当调制周期为15·24nm时,硬度达到最大,但随着调制周期增加,多层膜的硬度基本上保持为常数.分析了TiN/ZrN多层膜硬度变化的机制,认为界面厚度和择优取向是导致硬度变化的主要原因.更多还原

【Abstract】 TiN/ZrN multilayers were fabricated using reactive radio_frequency magnetron sputtering methods. X_ray diffraction analysis was used to determine the modulation structure of the multilayers. Using high_resolution transmission electronic microscopy, the interface was found to be a mixed layer of 2—3 nm in thickness. The nano_indentation measurement showed that the hardness of TiN/ZrN multilayers varied with the modulation period. Both the hardness and elastic modulus had their maximums for the multilayer with a modulation period of about 15.24 nm. The enhancement in hardness is discussed with different hardening mechanisms. The interface states and preferred orientation are assumed to be the main causes of the enhancement of TiN/ZrN multilayers in hardness.更多还原