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铜上采用过渡层沉积类金刚石薄膜的研究

Diamond-like carbon (DLC) films deposited on copper substrate through preparation of intermediate layers

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【作者】 王静刘贵昌汲大鹏徐军邓新禄

【Author】 Wang Jing 1) Liu Gui-Chang 1) Ji Da-Peng 1) Xu Jun 2) Deng Xin-Lu 2) 1)(School of Chemical Engineering, Dalian University of Technology, Dalian 116012, China)2)(State Key Laboratory of Surface Modification by Laser, Ion, and Electronic Beams, Dalian University of Technology, Dalian 116012, China)

【机构】 大连理工大学化工学院大连理工大学三束改性国家重点实验室大连理工大学三束改性国家重点实验室 大连116012大连116012

【摘要】 将等离子增强非平衡磁控溅射物理气相沉积(PEUMS-PVD)和电子回旋共振-微波等离子体增强化学气相沉积(MW-ECRPECVD)技术相结合,通过制备不同的过渡层,在铜基上成功地制备了类金刚石膜.拉曼光谱分析表明,所制备的碳膜具有典型的类金刚石结构特征.检测结果表明,随着沉积偏压的增大,D峰和G峰均向高波数漂移,ID/IG值增大,表面粗糙度减小,而平均硬度和弹性模量呈先增大后减小的趋势.

【Abstract】 Diamond-like carbon (DLC) films were prepared on copper substrate through preparation of intermediate layers by combined plasma enhanced sputtering physical vapor deposition and microwave electron cyclotron resonance plasma enhanced chemical vapor deposition techniques. Raman spectroscopy indicated that the films had amorphous structure and typical characteristic of DLC film. With the increase of deposition bias voltage, D and G band both shifted to high wave-number and I-D/I-G increased gradually. The morphology was characterized by atomic force microscopy (AFM) and the results indicated that the films were dense and homogeneous , and the roughness of the films decreased with the increase of the deposition bias voltage. Hardness and modulus of DLC were measured by the nanoindentation.

  • 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,2006年07期
  • 【分类号】O484.4
  • 【被引频次】11
  • 【下载频次】363
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