【摘要】 用掠入射X射线衍射及X射线反射对磁控溅射制取的等原子比Ni/Ti周期性多层膜晶化热处理后的TiNi形状记忆薄膜室温微结构进行了研究.TiNi形状记忆薄膜在深度方向的相分布和元素分布是不均匀的,都是一种多层结构.室温下其微结构特征为最外层是Ti氧化膜,再下层是Ti3Ni4,B19’马氏体相和少量的B2奥氏体相的三相混合物,靠近基体为主要相成分马氏体,最后是Ni和Si界面反应层.X射线反射率的拟和结果显示薄膜微结构的分析是合理的.薄膜中相深度分布的不均匀性主要是动力学因素决定的.更多还原

【Abstract】 Phase depth profile in TiNi shape memory alloy films is studied by the combination of grazing-incidence X-ray diffraction and X-ray reflectivity measurement. The film is made from sputter-deposited Ni/Ti multilayers. At room temperature, both the phase depth profile and element depth profile are not uniform, and both have multilayer structure. There is a three-phase mixture region consisting of Ti₃Ni₄ precipitates, martensite and a little of austenite near the free surface. A uniform martensite phase is formed near the substrate. Diffusion and reaction take place between film and substrate. The simulation result of X-ray reflectivity shows that the results of film microstructure analysis are reasonable. It is the kinetic factors that mainly cause the ununiformity of phase depth profile in the film.更多还原