【摘要】 采用溶胶凝胶法,结合旋转涂敷技术在石英衬底上制备了210—240nm厚度的ZnO∶In薄膜.使用掠角入射X射线衍射(GI_XRD)、常规X射线衍射、傅里叶变换红外光谱、原子力显微镜、光致发光谱以及不同入射角GI_XRD谱(α=1,2,3和5°)等手段,对不同掺杂浓度的ZnO∶In薄膜进行了结构分析.发现ZnO∶In薄膜内部是由大尺寸(002)晶向的无应力ZnO晶粒堆积而成,而薄膜表面主要是小尺寸的(002)和(103)晶粒,并且适量的In掺杂能有效改善ZnO薄膜内部的晶体结构特性.更多还原

【Abstract】 ZnO∶In thin films with thickness varying in the 210—240nm range were prepared on quartz substrates by sol_gel spin_coating technique. The structural properties of these thin films (In/Zn=0, 1, 2, 3 and 5at%) were studied by grazing incidence X_ray diffraction, conventional X_ray diffraction, Fourier transform infrared spectroscopy, atomic force microscopy and photoluminescence. It is found that the ZnO∶In thin films are composed of the unstressed bulk layer packed up by large grains with (002) plane and the surface layer by small grains with (002) and (103) planes, and a proper In doping concentration can improve structural properties of ZnO thin films. The analytic results were further proved by grazing incidence X_ray diffraction at different incidence angles (α=1, 2, 3 and 5°).更多还原