【摘要】 研究了氮气分压对薄膜沉积速率、表面形貌、电阻温度系数(TCR)以及电阻率的影响。利用原子力显微镜表征了薄膜的表面形貌,用Alpha-Step IQ台阶仪和四探针测量了薄膜的厚度和方块电阻。结果表明:薄膜沉积速率随氮气分压增大而减小;热处理使薄膜颗粒尺寸均匀,电阻率减小,电阻迟滞减小且TCR由负值变为正值。更多还原

【Abstract】 The nitrogen partial pressure dependence of deposition rate,surface morphology,TCR and resistivity is studied in this article.The films were characterized by AFM to study surface morphology.The film’s thickness and sheet resistance were measured by Alpha-Step IQ Profilers and four-point probe.The experimental results showed that for as-deposited film,deposition rate decreased with increasing partial pressure;heat-treatment made the average grain size and the total resistance reduction decreased.After annealing,the resistivity of films decreased and TCR turn into positive value.更多还原