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磁控溅射法制备CeO2-TiO2紫外吸收薄膜
Prepartation of CeO2-TiO2 Thin Films for UV Absorbing by RF Sputtering
【摘要】 采用射频磁控溅射在玻璃基片上沉积具有紫外吸收CeO2-TiO2混和薄膜。通过制备一系列不同物质的量浓度比的n(CeO2)∶n(TiO2)靶材(1.0∶0,0.90∶0.10,0.80∶0.20,0.70∶0.30,0.60∶0.40,0.50∶0.50,0.40∶0.60,0.30∶0.70,0.20∶0.80,0.10∶0.90,0∶1.0),研究其紫外吸收性能最佳的物质的量浓度比。TiO2加入CeO2后,改变CeO2的结晶状态并提高UV吸收。采用Raman和XPS表征薄膜的特性,物质的量浓度比值在n(CeO2)∶n(TiO2)=0.5∶0.5,0.6∶0.4时,薄膜为非晶态,并具有高的紫外吸收(98%)和可见光透过率(70%~80%);XPS分析表明薄膜存在Ce4+,Ce3+和Ti4+。
【Abstract】 Ultraviolet ray(UV) absorbing coating consisting of a complex oxide of cerium andtitanium was deposited on glass substrates by RF sputtering.These films were deposited at different molar ratio CeO2-TiO2 targets of CeO2 to TiO2((1.0∶0),0.90∶10,0.80∶0.20,0.70∶0.30,0.60∶0.40,0.50∶0.50,0.40∶0.60,0.30∶0.70,0.20∶0.80,0.10∶0.90,0∶1.0).Addition of TiO2 to CeO2 changed the crystallinity and coordination state of CeO2 and improved UV absorption.These films were characterized by Raman spectroscopy,and X-ray photoelectron spectroscopy and spectrometer.The amorphous phases composed of n(CeO2)∶n(TiO2)(0.6∶0.4,0.5∶0.5) played an important role in absorbing UV(98%)with high visible light(70%~80%).XPS analysis indicated that tetravalent Ce4+,Ti4+ and trivalence Ce3+ were present in the films.
- 【文献出处】 武汉理工大学学报 ,Journal of Wuhan University of Technology , 编辑部邮箱 ,2006年01期
- 【分类号】TB383.2
- 【被引频次】9
- 【下载频次】340