节点文献
ZnO陶瓷靶制备及其薄膜RF溅射工艺研究
Li-doped ZnO Ceramic Target Preparation and RF Magnetron Sputtering ZnO Films
【摘要】 利用固相反应制备了直径为70mm,厚度为10-15mm高质量掺杂Li2CO2的ZnO陶瓷靶材,实验了不同摩尔浓度的Li+掺杂对靶材性能的影响,确定了最佳Li+掺杂量为2.2mol%,同时通过在不同温度烧结实验、不同成型压力实验确定了ZnO靶材制备的最佳工艺,并采用所制备的ZnO-Li2.2%陶瓷靶和RF(射频磁控)技术在Si(100)、玻璃(载玻片)、及Pt(111)/Ti/SiO2/Si(100)基片上制备出高度c轴(002)择优取向的ZnO薄膜,其绝缘电阻率ρ为4.12×108Ω·cm,达到了声表面波器件(SAW)的使用要求.
【Abstract】 We successfully prepared high quality Li-doped ZnO ceramic targets with 70mm in diameter and 10~15mm in depth by solid-state reactions. The paper studied the influence of different concentration of Li2CO3 on the electrical properties of ZnO ceramic target. By comparing and analyzing the IR( insulative resistivity ) and tgδ(dielectric loss), the optimum concentration of Li2CO3 doped in ZnO ceramic target was obtained(2.2%mol ratio). And the optimum process for preparing ZnO-Li22% ceramic target was also realized through the investigation of physics and electrics of ZnO ceramic under the different sintering temperatures and molding pressure treatments. By using Li22%-doped ZnO ceramic as the target, the ZnO films with highly c-axis (002) preferred orientation were grown by RF magnetron sputtering on Si(100), glass and Pt(111)/Ti/SiO2/Si(100) substrates respectively.
【Key words】 ceramic target; zinc oxide films; RF magnetron sputtering; preferred orientation;
- 【文献出处】 无机材料学报 ,Journal of Inorganic Materials , 编辑部邮箱 ,2006年04期
- 【分类号】TQ174.1
- 【被引频次】9
- 【下载频次】407