【摘要】 报道了采用对靶磁控溅射法制备的铁镍氧化物薄膜的其光电特性和结构与氧氩比之间的关系:氧气含量在20%~1%的范围内改变时,获得材料的电阻率为102~103Ω.cm;反应室中氧气含量较高(20%)时,材料的晶化强度较小,过电势有所降低,电流密度为10mA/cm2时过电位为321mV。更多还原

【Abstract】 The iron-nickel oxide,which has better properties of anticorrosion and activity of oxygen evolution reactive in alkaline solution,is as the catalysis anode of photoelecrochemical hydrogen production using solar cell.The iron-nickel oxide films were deposited by reactive magnetron sputtering with two face-to-face targets.The relation between photo-electric and structure performance was obtained,the resistivity is 10~2～10~3Ω·cm when the oxygen ratio was varied between 20%～1%. Its overpotential was also decreased as higher oxygen ratio(20%).The overpotential was 321mV as the current density of 10mA/cm~2.更多还原