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PROM器件中Ni-Cr熔丝的设计
Design of Ni-Cr fuse used in PROM devices
【摘要】 介绍了应用在PROM器件中的Ni-Cr熔丝电阻的设计.熔丝是决定PROM器件稳定性的关键元件.Ni-Cr薄膜材料有良好的半导体加工特性和温度稳定性.通过热学分析和测试实验,得到相关数据,设计出熔丝形状以及三维尺寸.再根据此集成电路器件的整体版图布局设计出可应用到PROM中的Ni-Cr熔丝.采用磁控溅射方法,通过控制工艺条件得到所需的薄膜厚度,经光刻形成所需图形.通过产品的读取测试实验,取得了良好的效果.
【Abstract】 The design of Ni-Cr fuse resistor used in PROM Deviceis introduced.The fuse is a(crucial factor) affecting the stability of PROM devises.Ni-Cr thin film has excellent characteristics of(semiconductor) (process) and good temperature stability.Through calorifics analysis and experiments,relevant useful data can be obtained,fuse’s shape and its three-dimension size can be designed.The Ni-Cr fuse must designed match with the whole layout design of PROM.Magnet-controlled sputtering approach was(adopted) to(obtain) thin film with the suitable thickness,and then,the graph of design is formed by photo etching.The expectant results are gained with the read operations.
- 【文献出处】 沈阳工业大学学报 ,Journal of Shenyang University of Technology , 编辑部邮箱 ,2006年03期
- 【分类号】TM563
- 【下载频次】61