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多晶Co膜退火前后磁滞标度行为研究
Behavior of Hysteresis Scaling on Thin Polycrystalline Co Film before and after Annealing
【摘要】 研究了多晶Co薄膜制备态与退火态的磁滞回线与标度行为,结果表明:对易轴方向A∝A0+H(0.67-1.00)Ω0.90,对难轴方向A∝A0+H(1.75-2.50)Ω(1.45-0.95),与理论计算(α=0.95,β=0.28(Heisenberg模型))作比较,A与H的关系符合的较好,A与Ω的指数关系有些差异,这种差异还有待进一步研究。
【Abstract】 The behavior of hysteresis scaling on thin polycrystalline Co film before and after annealing is studied.The results are A∝A0+H(0.67-1.00)Ω0.90for easy direction and A∝A0+H(1.75-2.50)Ω(1.45-0.95) for difficult direction.The consistence between them is found and compared with those from theory calculation((α=0.95,β=0.28(Heisenberg Model)):A and H is well,A and Ω have variety.This variety will be researched in future.
【关键词】 多晶Co薄膜;
磁滞回线;
标度行为;
【Key words】 thin polycry stalline Co film; magnetic hysteresis loops; scaling behavior;
【Key words】 thin polycry stalline Co film; magnetic hysteresis loops; scaling behavior;
【基金】 福建省教育厅A类基金(JA03180)
- 【文献出处】 济南大学学报(自然科学版) ,Journal of Jinan University(Science and Technology) , 编辑部邮箱 ,2006年04期
- 【分类号】TM271
- 【被引频次】1
- 【下载频次】37