【摘要】 介绍了一种可应用于X射线Kirkpatrick-Baez(KB)显微镜的光学元件X射线超反射镜。选用的W和B4C作为镀膜材料,膜对数为20,采用单纯型调优的方法实现了X射线超反射镜设计,用磁控溅射的方法在Si基片上完成了W/B4C X射线超反射镜的制备。采用高分辨率X射线衍射仪(8 keV)测量了X射线超反射镜的反射特性。制备的X射线超反射镜在掠入射角分别为1.052°和1.143°处,反射角度带宽为0.3°,反射率达到20%,可满足KB型显微镜的要求。更多还原

【Abstract】 Design and fabrication of the X-ray supermirror used as reflective optical element in Kirkpatrick-Baez（KB） microscope were proposed.W/B₄C was selected as coating materials pair.Design method and optimization of X-ray supermirrors were discussed.The designed multilayer structure was deposited on the Si wafer substrate using magnetron-sputtering system.The reflectivities of W/B₄C supermirrors were measured by X-ray diffraction instrument（8 keV）.The reflectivities of supermirrors are 20% at 1.052° and 1.143° designed grazing incident angles.The bandwidth of reflective plateau reaches 0.3°,which can fulfill the requirements of KB microscope.更多还原