【摘要】 采用分子自组装成膜技术,在磁头表面制备了1H,1H,2H,2H-全氟癸烷基三乙氧基硅烷(FTE)自组装膜。使用时间飞行二次离子质谱仪(TOF-S IM S)、X射线光电子能谱仪(XPS)、原子力显微镜(AFM)和接触角测量仪对FTE自组装膜进行了表征。XPS测得的FTE自组装膜C 1s谱图中有分谱出现在287.905 eV位置,这证明FTE分子以C—O—S i键与磁头表面结合。通过分析TOF-S IM S测量的不同反应时间的膜厚和其对应的AFM表面形貌图发现,FTE自组装膜形成过程分为表面亚单层膜低覆盖、表面亚单层膜中等覆盖、团聚和聚结4个阶段。实验结果表明,控制反应时间可以在磁头表面制备超薄平整的FTE自组装膜,膜厚为(1.20±0.01)nm,表面粗糙度小于0.2 nm。该层超薄膜使磁头对水的接触角增加到110.5°±0.1,°令磁头的疏水性能得到很大提高,进而较大幅度地提高了磁头表面的抗污染能力。更多还原

【Abstract】 The hydrophobicity and anti-contamination ability of magnetic head surfaces were improved using self-assembly of silane with a hydroxyl group to form a selfassembled monolayer of 1H,1H,2H,2H-perfluorodecyltriethoxysilanes on the magnetic head.A time-of-flight secondary ion mass spectrometer(TOF-SIMS),X-ray photoelectron spectroscopy(XPS),an atomic force microscopy(AFM),and contact angle measurements were used to characterize the monolayer.A component centered at a binding energy of 287.905 eV in the XPS spectra suggests that the monolayer deposit on the magetic head surface with the C—O—Si bond.Comparison between the film thicknesses for various reaction times using TOF-SIMS and the corresponding morphologies using the AFM shows that the monolayer forms through four regimes in the growth process,a low-coverage nucleation regime,an intermediate coverage regime,an aggregation regime,and a coalescence regime.The experimental results show that an ultrathin smooth monolayer,with a thickness of(1.20±0.01)nm,Ra of less than 0.2 nm and a water contact angle of 110.5°±0.1°,can be prepared on the magnetic head surface by controlling the reaction time and that this ultra-thin film considerably improves the hydrophobicity of the magnetic head surface.更多还原