【摘要】 以单头单面旋转式化学机械抛光机为例建立了抛光头的运动模型,并利用Matlab软件模拟出了抛光头的运动轨迹,分析并讨论了抛光盘和抛光头两者之间不同的转速比、旋转方向、偏心距以及抛光点的初始位置等参数对抛光轨迹和抛光质量的影响,为CMP机床的结构和运动设计提供理论依据。更多还原

【Abstract】 A kinematic model of polishing head in CMP is developed and the kinematic traces of the polishing head are simulated by software Matlab.The effects of variables to polishing traces and quality,such as rotational speed ratio and directions of polishing pad and head,eccentric distance and initial position of polishing are analyzed for providing theoretical guide to design the structure and motion mode of the CMP equipment.更多还原