【摘要】 利用直流磁控溅射技术制备三元BCN薄膜,通过改变N2/Ar流量比(0.0~0.3)得到不同含氮量的薄膜.采用X射线光电子能谱仪和傅立叶红外光谱仪分析薄膜的成分和结构,采用纳米压入仪分析薄膜的纳米力学性能和纳米摩擦磨损特性,分别采用连续刚度测量法和横向力测量法测试薄膜的硬度和划痕行为.结果表明:薄膜中氮含量随N2/Ar流量比增加而增大并趋于稳定;反应气体中的氮优先与硼结合生成B-N键,当N2/Ar流量比超过一定值后,部分氮与碳结合生成C=N键;薄膜的纳米硬度和弹性模量随薄膜中氮含量的增加而下降;BCN薄膜的划痕深度与薄膜的结构密切相关,而摩擦系数受薄膜结构的影响不明显;在相同载荷下薄膜的划痕深度随薄膜中氮含量增加而增大;对于同一试样,薄膜在未破裂之前摩擦系数基本保持在0.10左右,薄膜破裂后摩擦系数迅速增至0.46.更多还原

【Abstract】 Boron carbon nitride（BCN） films were deposited by d.c.magnetron sputtering.The films with various content of N were obtained by varying N₂/Ar flow ratio in the mixed gas from 0.0 to 0.3.Structures and compositions of the films were investigated by X-ray photoelectron spectroscopy （XPS） and Fourier transform infrared spectroscopy（FTIR）.The nano-hardness,elastic modulus and nanotribological behavior of films were studied by a nano-indenter.Continuous stiffness measurement and lateral force measurement were used to measure the hardness and scratch behavior respectively.The loads used in scratch test were 2、5、10 and 20 mN.The results show that the nitrogen content had a rising tendency and then came to the saturation stage with increasing N₂/Ar flow ratio.Nitrogen in the film was prior to binding with B for forming sp² B-N bond,and then with C for forming C=N bond when the N₂/Ar ratio was over a certain value.The increase of N₂/Ar flow ratio decreased the hardness and elastic modulus.The scratch depth of BCN films were mainly depended on the component of bonding structures in the films,but the effect of bonding structures on the friction coefficient was not obvious.The scratch depth of BCN films increased with the increasing of the nitrogen concentration.The scratch depth of the BCN film increased with the increasing of the loads.Coefficient of friction of the film was about 0.1 before fracture,but increased quickly to 0.46 after fracture.更多还原