【摘要】 综合考虑宏观条件对射频溅射镀膜过程的影响,采用等离子鞘层理论、理想气体理论、蒙特卡罗法,模拟在真空气压、气体流量、电压、温度等等参数综合作用后离子的能量、方向、分布等。相应实验验证结果与模拟结果较为一致,因此,可以认为目前的结论足以作为进一步模拟的条件。更多还原

【Abstract】 Considering the effects of macro-conditions on films′ deposition by R.F sputtering,this article uses plasma-sheath theory,ideal-gas theory and Monte Carlo method to simulate energy and direction distribution of ion under the influence of sputtering ambience,sputtering pressure,gas flow ratio,voltage and temperature.The simulation results agree with experimental results,and the present conclusion can be used as a condition for further simulation.更多还原