【摘要】 以TiO2/SiO2为光催化剂,在紫外光作用下,讨论了NO2存在时,庚烯在TiO2/SiO2上的吸附和光催化降解作用.通过GC-MS和FT-IR,分别测定了3种不同体系的反应产物,从而推测出可能的反应机理.实验结果表明,TiO2/SiO2对庚烯的最大吸附量Mmax=3.10 mg,当存在NO2(44.64μmol/L)时Mmax=3.80 mg.在光催化降解庚烯的反应中,当NO2加入量较大(NO2≥89.28μmol/L)时,庚烯降解反应速率加快,但矿化度比无NO2时的小.更多还原

【Abstract】 The adsorption and photocatalytic degradation of heptene on（TiO₂/SiO₂） photocatalyst under the irradiation of UV light were investigated carefully in the presence of NO₂.By means of GC-MS and FT-IR,we（respectively） determined the intermediate products of the three different reaction systems,and accordingly（deduced） the possible reaction mechanisms.The experiment data indicate that M_max（the maximum adsorption（amount） of（TiO₂/SiO₂） for heptene） is 3.10 mg,and is increased to 3.80 mg in the presence of NO₂（（44.64 μmol/L）.） In the photocatalytic degradation of heptene,addition of a large（amount） of NO₂（（NO₂≥89.28 μmol/L）） can accelerate the photodegradation reaction rate of heptene,but its mineralization degree with the addition of（NO₂） is lower than that without the addition of NO₂.更多还原