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自然掺杂及N-Al共掺杂ZnO薄膜的发光特性

Photoluminescence of ZnO Films Naturally Doped and Codoped with N and Al

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【作者】 傅广生; 孙伟; 吕雪芹; 王春生; 尹志会; 于威;

【Author】 FU Guang-sheng~1,SUN Wei~1,LAU¨U Xue-qin~1,WANG Chun-sheng~1,YIN Zhi-hui~(1,2),YU Wei~1()~1College of Physics Science and Technology,Hebei University,Baoding,Hebei 071002,China()~2Physics Department,College of Hengshui,Hengshui,Hebei 053000,China

【机构】 河北大学物理科学与技术学院; 河北大学物理科学与技术学院 河北保定071002; 河北保定071002; 衡水学院物理系; 河北衡水053000;

【摘要】 采用螺旋波等离子体辅助溅射技术制备了自然掺杂及N-Al共掺杂ZnO薄膜,对两种不同类型掺杂薄膜的低温光致发光(PL)特性进行了研究。实验结果表明,二者均呈现出了较强的与受主能级相关的发光特征,自然掺杂薄膜的光致发光谱在404.0 nm处出现了由于锌空位产生的近带边发光,N-Al共掺杂薄膜的光致发光谱在383.0 nm处出现了N作为受主的施主-受主对(DAP)跃迁发光。两种薄膜的发光特性比较分析表明,N-Al共掺杂技术能够有效提高N的固溶度,N受主能级密度增加使薄膜表现出较强的施主-受主对跃迁发光,表明该技术为实现p型ZnO薄膜制备的有效方法。

【Abstract】 ZnO films naturally doped and codoped with N and Al are deposited by helicon wave plasma assisted sputtering method.Their photoluminescence(PL) properties have been studied at low temperature.Experiments results show that the acceptor-related PL can be observed in the two kinds of films.The near-band-edge emission around 404.0 nm induced by the zinc vacancy is observed in the film naturally doped,whereas the donor-acceptor pair(DAP) transition luminescence around 383.0 nm in which N acts as the acceptor is observed in the film codoped with N and Al.The comparison between two PL shows that codoped method with N and Al can efficiently improve the dissolvability of N in the films,in which the acceptor-related levels can be easily introduced and the DAP PL can be observed.It is indicated that codoped with N and Al is an efficient method to produce p-type ZnO films.

  • 【文献出处】 中国激光 ,Chinese Journal of Lasers , 编辑部邮箱 ,2006年04期
  • 【分类号】O484.41
  • 【被引频次】5
  • 【下载频次】185
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