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环化聚丁二烯的合成及其在光刻胶中的应用

Synthesis of Cyclized Polybutadiene and Its Application in Photoresists

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【作者】 张玉军郑岩张明艳

【Author】 ZHANG Yu-jun,ZHENG Yan and ZHANG Ming-yan(School of Materials Science and Engineering,Harbin University of Science and Technology,Harbin 150080,China)

【机构】 哈尔滨理工大学材料科学与工程学院哈尔滨理工大学材料科学与工程学院 黑龙江哈尔滨150080黑龙江哈尔滨150080

【摘要】 本文扼要地阐述了国内外环化橡胶的研究发展状况,介绍了环化天然橡胶、环化聚异戊二烯橡胶和环化聚丁二烯橡胶的合成新方法及其结构表征技术。其中,重点介绍了环化聚丁二烯橡胶的合成新技术。由于环化橡胶负性光刻胶对金属及硅片的粘接性和耐酸性方面的优异性能以及其良好的热稳定性能,因此被广泛应用于硅、二氧化硅及铬不锈钢等材料的光刻,因而在高密度集成电路的生产与研制上得到了广泛应用。同时,本文还介绍了市场上常见的几种环化橡胶光刻胶产品。

【Abstract】 The research situation about the synthesis and characterization of cyclized rubbers including cyclized natural rubbers,cyclized polyisoprene rubbers as well as cyclized polybutadiene rubbers were set forth and illustrated in this paper.Of all the cyclized rubbers,the synthesis technique of cyclized polybutadiene rubbers and their application in photoresists were predominantly reviewed.The cyclized rubbers photoresists have been widely used in photoetching on silicon,silica,chrome non-corrosive steel or high-density photoetching integrated circuit because of their good adhesion with metal and chips of silicon,good acid resistance as well as heat resistance.In addition,several products of negative photoresists in the market were also introduced in this paper.

【关键词】 环化聚丁二烯合成光刻胶
【Key words】 cyclized polybutadienesynthesisphotoresist
【基金】 黑龙江省海外学人科技合作项目(编号:1053HQ001);哈尔滨市青年基金资助项目(编号:2004AFQXJ048)
  • 【文献出处】 化学与黏合 ,Chemistry and Adhesion , 编辑部邮箱 ,2006年03期
  • 【分类号】TQ436
  • 【被引频次】10
  • 【下载频次】414
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