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等离子体辅助电子枪蒸发制备AlN薄膜及等离子体参数诊断

PREPARED AlN THIN FILMS BY PLASMA ASSISTED ELECTRON BEAM EVAPORATION AND THE DIAGNOSIS OF PLASMA PARAMETERS

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【作者】 向鹏飞陈俊芳蒙高庆胡社军吴先球符斯列李赟

【Author】 XIANG Peng-fei,CHEN Jun-fang,MENG Gao-qing,HU Shejun,WU Xiang-Qiu,FU Si-Lie,LI Yun (School of Physics and Telecommunications Engineering,South China Normal University,Guangzhou 510006,China)

【机构】 华南师范大学物理与电信工程学院华南师范大学物理与电信工程学院 广东广州510006广东广州510006

【摘要】 采用射频TCP(Transverse coup led p lasm a)等离子体辅助电子枪蒸发技术首次在室温下制备了氮化铝薄膜,用傅立叶变换红外光谱仪分析了氮化铝薄膜红外光谱的特性.利用朗缪尔静电单探针诊断了射频TCP离子束辅助电子枪蒸发镀膜装置反应室内等离子体密度的空间分布规律,并分析了气压对等离子体分布的影响.离子源口等离子体密度较大,但分布不均匀;反应室内等离子体迅速扩散,密度变小,分布趋向于均匀.

【Abstract】 Aluminium nitride thin film was prepared at room temperature for the first time by means of TCP plasma assisted electron beam evaporation deposition.Analysis by Fourier transform infrared spectroscopy(FT-IR) reveals the FTIR characteristic of AlN.The properties of spatial distribution of plasma ion density in RF TCP plasma reaction chamber were diagnosed by a Langmuir probe and the effect of air pressure were investigated.Plasma ion density at the exit of ion fountain is big but with a poor uniformity.Plasma ion diffuses quickly in reaction chamber,the density of it becomes small and the its plasma distribution tends to become uniform.

【基金】 国家自然科学基金资助项目(10575039);广东省自然科学基金重点资助项目(05100534);高等学校博士点专项科研基金资助项目([2004]165);广州市科技计划资助项目([2005]Z3-D2031)
  • 【文献出处】 华南师范大学学报(自然科学版) ,Journal of South China Normal University(Natural Science Edition) , 编辑部邮箱 ,2006年02期
  • 【分类号】O484.1
  • 【被引频次】1
  • 【下载频次】226
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