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离子层气相反应法制备CuInS2半导体薄膜(英文)

PREPARATION OF CuInS2 THIN FILMS BY ION LAYER GAS REACTION

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【作者】 钱进文靳正国邱继军刘志锋

【Author】 QIAN Jinwen,JIN Zhengguo,QIU Jijun,LIU Zhifeng (Key Laboratory for Advanced Ceramics and Machining Technology of Ministry of Education,School of Materials,Tianjin University,Tianjin 300072,China)

【机构】 天津大学材料学院先进陶瓷与加工技术教育部重点实验室天津大学材料学院先进陶瓷与加工技术教育部重点实验室 天津300072天津300072

【摘要】 以CH3CH2OH为溶剂,CuCl和InCl3为反应物,H2S为硫源,用离子层气相反应法制备了CuInS2半导体薄膜。用X射线衍射、X射线光电子谱、扫描电镜和紫外-可见光谱等对薄膜的晶型、表面化学组成、表面形貌及光电性能进行了表征。分析了混合前驱体溶液中阳离子浓度比[Cu]/[In]对薄膜化学计量及性能的影响。[Cu]/[In]≥1.25时,可获得黄铜矿结构的CuInS2薄膜,其单相形成区外[Cu]/[In]为1.45~1.65。

【Abstract】 The CuInS2 thin films were prepared by ion layer gas reaction using C2H5OH as a solvent,CuCl and InCl3 as reagents and H2S gas as sulfuration source.The structural,chemical,topographical development and the photoelectric properties of thin films were investigated by X-ray diffraction,scanning electron microscopy,X-ray photoelectron spectroscopy and ultraviolet-visible spectros-copy.The effects of precursor solution on the stoichiometry of CuInS2 films were investigated.The results show that CuInS2 film with the complete chalcopyrite structure is obtained at [Cu]/[In]≥1.25,and near stoichimetric CuInS2 without any segregation phases is obtained in the range of 1.45—1.65.

【基金】 天津市重点基础研究(No.033802311)资助项目
  • 【文献出处】 硅酸盐学报 ,Journal of the Chinese Ceramic Society , 编辑部邮箱 ,2006年08期
  • 【分类号】O614.121
  • 【被引频次】2
  • 【下载频次】106
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