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离子层气相反应法制备CuInS2半导体薄膜(英文)
PREPARATION OF CuInS2 THIN FILMS BY ION LAYER GAS REACTION
【摘要】 以CH3CH2OH为溶剂,CuCl和InCl3为反应物,H2S为硫源,用离子层气相反应法制备了CuInS2半导体薄膜。用X射线衍射、X射线光电子谱、扫描电镜和紫外-可见光谱等对薄膜的晶型、表面化学组成、表面形貌及光电性能进行了表征。分析了混合前驱体溶液中阳离子浓度比[Cu]/[In]对薄膜化学计量及性能的影响。[Cu]/[In]≥1.25时,可获得黄铜矿结构的CuInS2薄膜,其单相形成区外[Cu]/[In]为1.45~1.65。
【Abstract】 The CuInS2 thin films were prepared by ion layer gas reaction using C2H5OH as a solvent,CuCl and InCl3 as reagents and H2S gas as sulfuration source.The structural,chemical,topographical development and the photoelectric properties of thin films were investigated by X-ray diffraction,scanning electron microscopy,X-ray photoelectron spectroscopy and ultraviolet-visible spectros-copy.The effects of precursor solution on the stoichiometry of CuInS2 films were investigated.The results show that CuInS2 film with the complete chalcopyrite structure is obtained at [Cu]/[In]≥1.25,and near stoichimetric CuInS2 without any segregation phases is obtained in the range of 1.45—1.65.
【Key words】 copper-indium-sulfur thin film; ion layer gas reaction; stoichiometry;
- 【文献出处】 硅酸盐学报 ,Journal of the Chinese Ceramic Society , 编辑部邮箱 ,2006年08期
- 【分类号】O614.121
- 【被引频次】2
- 【下载频次】106