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照明光瞳非对称性对光刻成像质量的影响
Impact of Illumination Pupil Filling Unbalance on Imaging Performance of Lithography
【摘要】 研究了照明光瞳非对称性对光刻成像质量的影响。通过PROLITH软件计算了环形与四极照明条件下,光瞳非对称性对图形位置偏移量、曝光图形内水平线条与垂直线条的宽度差、曝光图形上密集线条与孤立线条之间线宽偏差的影响。研究结果表明,光瞳非对称性主要影响曝光图形的位置偏移量,光瞳非对称性引起的图形位置偏移量与光瞳非对称性的大小成线性关系。根据套刻精度的误差分配原则,计算得到光瞳非对称性的容限为5%。
【Abstract】 The impacts of pupil filling unbalance on image CD placement error,H-V bias(the size difference between the vertical lines and the horizontal lines) and I-D bias(the size difference between the isolated lines and the dense lines) are calculated using software PROLITH under annular and quardupole illumination settings.Calculations show that the main effect of pupil filling unbalance on imaging performance of lithography is the image CD placement error.The image CD placement error caused by pupil filling unbalance is proportional to the pupil filling unbalance.The tolerance of the pupil filling unbalance of 5% is achieved according to the budget of the overlay accuracy.
【Key words】 instrument; optical lithography; lithography simulation; off-axis illumination; pupil filling unbalance;
- 【文献出处】 光学学报 ,Acta Optica Sinica , 编辑部邮箱 ,2006年06期
- 【分类号】TN305.7
- 【被引频次】7
- 【下载频次】263