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聚合物纳米孔隙增透膜制备工艺的研究
Fabrication of Polymer Nanoporous Antireflection Film
【摘要】 论述了聚合物纳米孔隙增透膜的制备工艺流程,分析了聚合物材料分子量、实验环境温度和湿度、溶剂挥发性等条件对纳米孔隙增透膜的影响。研究表明,聚合物材料分子量的增大、温度的降低、湿度的升高以及采用挥发性弱的溶剂都将导致增透膜孔隙尺寸的增大,孔隙越大其对光的散射损耗就会增大,所以增透膜的透过率就越低。通过大量的试验分析得出一组较理想的工艺参量:使用低分子量的聚合物材料(小于15 kg/mol),环境温度大于25℃、环境相对湿度小于30%,在采用低沸点的溶剂如四氢呋喃等措施下可有效降低增透膜散射损耗。
【Abstract】 The technological process of polymer nanoporous antireflection film fabrication is discussed in detail.And the effects of molecular weight of the polymer,experimental temperature,humidity and the volatility of common solvent on the polymer nanoporous antireflection film are also analyzed.Larger(polymer’s) molecular weight,lower condition temperature,higher relative humidity and lower(solvent’s) volatility will lead to increasing the porous size and the scattering loss.So the transmission ratio of the film will be decreased.Lower molecular weight polymer((<15 kg/mol),) higher temperature(>25 ℃),relative humidity lower than 30%,and lower boiling point solvent such as tetrahydrofuran are the key points for a small porous size and high transmission ratio.
【Key words】 film optics; nanometer material; antireflection film; nanoporous film; fabrication technique;
- 【文献出处】 光学学报 ,Acta Optica Sinica , 编辑部邮箱 ,2006年01期
- 【分类号】O484.4
- 【被引频次】9
- 【下载频次】354