【摘要】 采用溶胶-凝胶法制备了纳米CeO2粉体,并采用XRD、TOF-SIMS对其进行了表征。结果表明平均晶粒度在13.3nm,粒度分布均匀。进而研究了纳米CeO2在玻璃基片抛光中的抛光性能。ZYGO形貌仪表明,抛光后其表面平均粗糙度值(Ra)可降低到0.6nm左右。原子力显微镜(AFM)在5μm×5μm范围内测得基片表面粗糙度Ra值为0.281nm,表面光滑,划痕等表面微观缺陷明显改善。更多还原

【Abstract】 With advanced electro-manufacture developing so fast,glass substrate as a kind of widely used material in the mechanical manufacture is forced to be ultra-smooth.Nano-sized CeO₂ was prepared by sol-gel method and characterized by X-ray diffraction and TOF-SIMS.It shows that the average particle diameter is 13.3nm and particle size distribution is uniform.The polishing performances of nano-sized CeO₂ on glass substrate were studied.ZYGO profiler indicated that the average roughness（Ra） of the surface was reduced to about 0.6nm.Atom Force Microscopy（AFM） showed that a super smooth surface with Ra of 0.281nm was obtained within 5μm×5μm area and micro-defects such as micro-scratches can hardly be observed.更多还原