【摘要】 Ta2O5是重要的介电材料和光波导材料。从前驱体的选择方面综述了化学气相沉积法制备Ta2O5薄膜的研究进展,说明了五卤化钽和Ta金属有机化合物对CVD过程的影响,对这两类前驱体的优缺点进行了比较和评述,讨论了Ta2O5的生成机理,并对其发展方向作了简要的展望。更多还原

【Abstract】 Ta₂O₅ is a kind of important dielectric material and optical waveguide material.Recent advances in the choice of precursors in the process of chemical vapor deposition（CVD） for Ta₂O₅ film are introduced. The effects for the choice of tantalum halide and Ta-containing metallorganic compound on the CVD process have been illustrated.The advantages and disadvantages of both precursors are compared and reviewed.The transformation mechanism is discussed and the prospect is presented.更多还原