【摘要】 采用磁控溅射方法在自然氧化的单晶Si(100)衬底上制备了双层结构的FePt-X/Ag(X=Ag或Pt)薄膜。以20nm厚的Ag做衬底,可以制备出易磁化轴垂直基片的FePt合金薄膜;Ag在FePt薄膜中优先团聚,不利于控制FePt晶粒的长大,调整Pt的含量可以控制热处理过程中FePt薄膜的晶粒尺度;通过XRD、TEM、VSM对薄膜样品的结构、晶粒尺寸的观察和磁性检测,我们认为FePt合金薄膜有序化转变的最佳热处理温度在400℃;经过500℃热处理,薄膜软硬磁耦合较好,晶粒尺寸约为100nm,有最大的矫顽力1.04×106A/m。更多还原

【Abstract】 FePt-X/Ag(X=Ag or Pt) films have been deposited on natural-oxidized Si(100) substrates by magnetron sputtering.The structures,grain sizes,and magnetic properties were measured by XRD,TEM and VSM.A 20nm Ag underlayer was found to be favorable for improving the(001) preferential orientation.Ag agglomerated in as-deposited films,the grain size of annealed FePt films decreased as Pt content increased.X-ray diffraction measurements showed the FePt phase in the film that undergo a phase transformation from a disordered face-centered-cubic(fcc) phase to an ordered face-centered-tetragonal(fct) phase at 400℃.The coercivity of the annealed FePt alloy films was 1.04×10~6A/m,whiles average grain sizes was about 100 nm in sample annealed at 500℃.更多还原