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Si3N4的生长动力学研究及其烧制温度场模拟
Researches on Si3N4 Growth Dynamics and Simulation on the Sintering Temperature Field
【摘要】 综述反应烧结制备Si3N4-SiC耐火材料的工艺、Si3N4的生长机理和Si的氮化动力学研究,并结合Si的氮化反应,对耐火砖烧制过程的温度场模拟的可行性进行了细致分析,提出通过对温度场的数值模拟,可严格控制耐火砖的烧制进程,进而改善产品质量和优化炉窑工艺参数,达到节能降耗的目的。
【Abstract】 This paper summarizes the technology of making Si3N4-SiC refractory materials in reaction sintering,the growth mechanism of Si3N4,and the nitride reaction dynamics of Si.It analyses the possibility to simulate the temperature field during firebricks processing.In order to improve the firebricks quality and optimize the operating parameters,it puts forward that the firebrick reaction process can be controlled strictly by the temperature field simulation.
- 【文献出处】 锅炉制造 ,Boiler Manufacturing , 编辑部邮箱 ,2006年02期
- 【分类号】TQ175.1
- 【被引频次】2
- 【下载频次】191