【摘要】 从加工尺度的连续性和加工技术的完整性这一新的角度,分析了纳米加工产业化面临的问题,并提出了相应的解决方案?多离子束聚焦投影技术。多离子束聚焦投影技术将填补传统微机加工技术和半导体图形技术之间0.5~5μm的加工空白,并会在1~100nm尺度间实现自上至下技术和自下至上技术的有机结合。纳米测量技术产业化的研究中,以提高扫描探针技术的样品质量作为出发点。在聚焦离子束和扫描电镜平台上集成Ar离子束的“三束”显微镜能有效降低样品的损伤,大大推动了纳米测量技术的发展。更多还原

【Abstract】 Scale continuity and technological integrality of nanofabrication is studied in this paper. Projection focused ion multi-Beam was brought forward to solve problems appeared in industrialization of nanofabrication. It closes the presently existing machining gap of 0.5~5μm between the classical micro machining technologies and semiconductor patterning technologies. It has achieved the combination of top-down structuring with selective bottom-up self-assembly techniques during the scale of 1~100nm. As regard to nanometrology, scanning probe technology is researched in detail. A “three-beam” system can effectively reduce sample damage by integrating Ar ion beam into a dual-beam system of focused ion beam and electron beam, which will accelerate the development of nanometrology.更多还原