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硅衬底清洗液中FA/O螯合剂的应用研究
Application Study of FA/O Chelating Agent in Cleaning Solutions for Silicon Wafer
【摘要】 FA/O螯合剂是一种具有1 3个螯合环的新型螯合剂,不含钠离子,并且易溶于水,稳定性好。通过对FA/O螯合剂在RCA标准清洗SC1、SC2溶液中的应用,对XPS的测试结果分析表明,FA/O螯合剂对Fe和Cu的络合能力比NH4OH的络合能力强,RCA标准清洗液中加入少量FA/O螯合剂就可使硅片表面微量铜、铁等金属污染物的去除效果显著增加。对清洗工艺的研究表明,在有螯合剂存在下,清洗温度控制在7 0℃,清洗时间为5 min.2次,效果更好。
【Abstract】 FA/O,a new kind of chelating agent was studied in RCA cleaning solutions,which has 13 chelating rings and is free of sodium,stable and easily soluble.The XPS results indicate that FA/O is better than NH4OH as a ligand.Cu and Fe contaminations on silicon wafer can be removed remarkably when adding little FA/O.The cleaning process conditions were also studied,70℃ and 5 min×2 may be the best.
【关键词】 FA/O螯合剂;
硅;
清洗;
金属污染物;
【Key words】 FA/O chelating agent; metal pollution; silicon wafer; cleaning;
【Key words】 FA/O chelating agent; metal pollution; silicon wafer; cleaning;
- 【文献出处】 电子器件 ,Chinese Journal of Electron Devices , 编辑部邮箱 ,2006年03期
- 【分类号】TN305.97
- 【被引频次】3
- 【下载频次】339