节点文献
VDMOS场效应晶体管的研究与进展
Research and Progress of VDMOS Field-Effect Transistor
【摘要】 介绍了新一代电力电子器件VDMOS的发展概况及工作原理,分析了其技术特点与优势,重点阐述了近年来国际上VDMOS在高压大电流及低压大电流方面所取得的理论及技术突破,通过不断改进的沟槽技术以及封装工艺提高了器件的整体性能,而Superjunction新结构、SiC新材料的采用突破了Si的高压应用理论极限。最后对未来的研究方向作了展望。
【Abstract】 The general situation and working principle of VDMOS Field-Effect Transistor are introduced.The features and advantages of this new generation of power electronics devices are presented. The theory and technology breakthroughs of the VDMOS Field-Effect Transistor in recent years are concluded, which focus on low voltage and high voltage power MOSFETs. The excellent performance is realized by the advanced trench and package technology, and the limit line of silicon for high voltage have been broken through the using of a new structure named Superjunction and a new SiC material. In the end, the VDMOS development and prospect are explored.
【Key words】 VDMOS; specific on-resistance; trench; superjunction;
- 【文献出处】 电子器件 ,Chinese Journal of Electron Devices , 编辑部邮箱 ,2006年01期
- 【分类号】TN386
- 【被引频次】54
- 【下载频次】1355