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TiO_x层在Pt/Ti电极中对Ti扩散的抑制作用
Control of the Ti Out-diffusion in Pt/Ti Bottom Electrode for Ferroelectric Thin Film
【摘要】 采用直流磁控溅射方法在SiO2/Si衬底上制备出Pt/Ti和Pt/TiOx底电极。用XRD分析其晶相结构,用AFM测量其晶粒尺寸和表面粗糙度。结果表明,用TiOx层代替金属Ti后,能有效地抑制在高温环境下Ti原子向Pt层扩散,使电极表面粗糙度减小(粗糙度为2.99 nm)。
【Abstract】 Pt/Ti and Pt/TiOx bottom electrodes were prepared on SiO2/Si substrate by DC-sputtering method.The X-ray measurements allowed us to get the crystal orientation and microstructure of the Pt electrodes.The size of grain and roughness of Pt/Ti or Pt/TiOx bottom electrodes caused by Ti out-diffusion before and after RTA treatment were observed by AFM.The results show that the roughness of Pt/Ti bottom electrode increases much higher and hillocks are formed after high temperature treatment,However,the surface of Pt/TiOx bottom electrode keeps quite flat(roughness is 2.99 nm).
【Key words】 electronic technology; ferroelectric tnin film; Pt/Ti electrode; roughness; Ti out-diffusion;
- 【文献出处】 电子元件与材料 ,Electronic Components and Materials , 编辑部邮箱 ,2006年03期
- 【分类号】TM221
- 【被引频次】3
- 【下载频次】105