【摘要】 用工业型脉冲直流等离子体化学气相沉积(PCVD)设备,在高速钢(W18Cr4V)基材表面沉积新型四元Ti-Si-C-N复合超硬薄膜。结果表明:Ti-Si-C-N薄膜是由面心立方结构的TiN和TiC纳米晶、Ti(C,N)固溶体及存在于晶界的非晶Si3N4和a-C组成,形成TiN/TiC/Ti(C,N)/a-C/a-Si3N4复相结构,这种复相结构存在着[111],[220]和[200]混合择优取向。SiCl4和CH4流量变化是影响薄膜相组成和硬度变化的主要工艺参数。随Si含量的增加,薄膜的显微硬度先升后降,表面形貌由致密的细颗粒状变为粗大的枝条状;C元素的加入能抑制柱状晶的形成,对硬度影响较小。更多还原

【Abstract】 Using a pulsed dc plasma chemical vapor deposition technology, a new class of quaternary Ti-Si-C-N coatings were depositedon HSS substrate at 550℃. The chemical composition and the hardness of coatings could be well controlled through the adjustment of CH4and SiCl4 flow rate. Results indicate that the Ti-Si-C-N coatings have a nanocomposite structure of TiN/TiC/Ti(C,N)/a-C/a-Si3N4 with amixed orientations of [111], [220] and [200]. On the other hand, the change of C content has a little effect on the hardness of coatings.However, the surface morphologies of Ti-Si-C-N coatings changed from granular to strip-shaped with the increase of Si and C content, andthe hardness of coatings reaches a maximum value of about 52 GPa at content of 9 at% Si and 24 at% C.更多还原