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基片温度对TiO₂薄膜表面形貌和性能的影响

Influence of Substrate Temperature on Surface Morphology and Properties of Titanium Oxide Thin Films

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【Author】 HUANG Yong-gang~1,CHEN Min~2,LI Chang-min~2,ZHANG Qing-yu~3,HUANG Ying~1(1.Institute of Special Glass Fiber & Photoelectric Functional Materials,China Building Materials Academy,Beijing 100024,China;2.Department of Materials Science and Engineering,Dalian Institute of Light Industry,Dalian 116034,China;3.State Key Laboratory of Materials Modification by Laser,Ion and Electron Beams & Department of Physics,Dalian University of Technology,Dalian 116024,China)

【机构】中国建筑材料科学研究院特种玻璃纤维与光电功能材料研究所；大连轻工业学院材料科学与工程系；大连理工大学三束材料改性国家重点实验室及物理系；中国建筑材料科学研究院特种玻璃纤维与光电功能材料研究所北京100024；辽宁大连116034；辽宁大连116024；北京100024；

【摘要】利用射频磁控溅射设备在玻璃基片上制备TiO2薄膜,采用AFM、UV-Vis分光光度、接触角测定仪等测试手段,研究基片温度对薄膜表面形貌、粗糙度和表面性能的影响。结果表明,随着基片温度增加,薄膜表面粗糙度增大,薄膜中颗粒由无定形态逐渐向定向排列的晶态转变,而薄膜结构、表面形貌和粗糙度的变化明显影响薄膜表面性能。最后,探讨了薄膜的生长机理。更多还原

【Abstract】 TiO₂ thin films were prepared on glass substrates by RF magnetron sputtering.The morphology,the roughness and the surface properties of films of different substrate temperature were studied by atomic force microscopy（AFM）,UV-Vis spectrophotometer,and contact angle microscopy.The results show that with the increase of substrate temperature,the surface roughness increased,the round,amorphous grain in films turned into shapely,crystal.The change of surface structure,morphology and roughness of films markedly influenced surface properties of TiO₂ thin films.Furthermore,the growth mechanism of films was analyzed.更多还原