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低压气相金刚石薄膜镀膜刀具膜/基附着性能压痕测试分析
Impression Test Study on Adhesion Between Substrate and Diamond Film Deposited by Low Pressure Vapor Deposition
【摘要】 低压气相金刚石薄膜硬质合金刀具在直流弧光放电等离子体CVD镀膜设备上制备。基底为YG6(WC-6%Co,质量分数)硬质合金刀具。采用洛氏(HRA)、表面洛氏(HRM)、维氏(HV)硬度试验机对所制备的金刚石薄膜刀具进行压痕测试;采用扫描电镜(SEM)观察压痕形貌并定性评价膜/基附着性能。结果表明:所制备的金刚石薄膜镀膜刀具的优选膜/基附着性能压痕测试方法是表面洛氏压痕法;优选测试条件为采用120°金刚石圆锥压头,测试加载载荷441N。
【Abstract】 The diamond film was deposited on WC-6%Co(mass fraction) cemented carbide by DC arc discharged plasma chemical vapor deposition.Impression test was conducted by Rockwell hardness test,Rockwell superficial hardness test and Vickers hardness test.The scanning electron microscope was used to observe the impression microstructure and qualitalitively evaluate adhesion between diamond film and substrate.The result shows that the preferring hardness impression test is Rockwell superficial hardness test,test parameter including copped diamond depressor loading 441N.
【Key words】 diamond film; cemented carbide; adhesion; impression test; plasma CVD;
- 【文献出处】 材料工程 ,Journal of Materials Engineering , 编辑部邮箱 ,2006年09期
- 【分类号】TG71;TB43
- 【被引频次】3
- 【下载频次】219