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溅射沉积Ni-Mn-Ga薄膜的研究进展

The Development of Sputtering Deposited Ni-Mn-Ga Thin Films

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【作者】 孙景文李长生李俊茂姚固文姜春华

【Author】 SUN Jingwen, LI Changsheng, LI Junmao, YAO Guwen, JIANG Chunhua(Mechanical Engineering School,Jiangsu University, Zhenjiang 212013)

【机构】 江苏大学机械工程学院江苏大学机械工程学院 镇江212013镇江212013

【摘要】 以Ni-Mn-Ga为主要代表的铁磁形状记忆合金(FSMAs)不但具有传统形状记忆合金受温度控制的热弹性形状记忆效应,而且具有受磁场控制的铁磁形状记忆效应。微机电系统(MEMS)的应用要求Ni-Mn-Ga合金必须制备成薄膜的形式。对溅射沉积Ni-Mn-Ga薄膜的制备工艺进行了回顾与总结,对薄膜的各种性能特征和影响因素进行了详细的叙述,最后介绍了溅射沉积Ni-Mn-Ga薄膜的应用状况和应用趋势。

【Abstract】 The ferromagnetic shape memory alloys(FSMAs)such as Ni-Mn-Ga alloys is a new type of intelligent material that has both conventional thermal shape memory effect and magnetic shape memory effect which is due to a magnetic field-induced rearrangement of martensitic variants. In order to be applied in the MEMS field, Ni-Mn-Ga alloys have to be in the form of thin films. In this text,the magnetron sputtering technologies of Ni-Mn-Ga thin films are introduced and then the relationship between the film performance and the corresponding affection factors are explained. At last the applications and future trends are introduced.

  • 【分类号】TB383.2
  • 【被引频次】5
  • 【下载频次】179
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