【摘要】 利用等离子体辅助真空电弧沉积技术,在高速钢和单晶硅基体上制备Zr-Cu-N复合薄膜。采用X射线衍射仪(XRD)、扫描电镜(SEM)和超微显微硬度计研究了低能氮离子束流对Zr-Cu-N涂层结构、表面形貌和硬度的影响。结果表明:用低能氮离子束辅助真空电弧沉积Zr-Cu-N膜,ZrN结构在(111)晶面出现择优取向,并对Zr-Cu-N膜层有一定的强化作用,膜层表现出较高的显微硬度和转好的耐磨性能。更多还原

【Abstract】 Zr-Cu-N film is deposited on high speed steel and single crystal silicon slice by vacuum arc deposition. The influences of low energy nitrogen ion beam aid deposition on structure and morphology of Zr-Cu-N film is studied by XRD, SEM.The results show that bombarding Zr-Cu-N film with low energy ion beam,ZrN phase with (111) preferential orientation can be formed and then Zr-Cu-N film can be strengthened. The microhardness and wear-resisting property of the film icrease.更多还原