【摘要】 以聚四氟乙烯(PTFE)为靶材,用射频磁控溅射方法在玻璃衬底上制备了氟碳高分子薄膜,并对其结构和表面性能进行了研究。由XPS的结果可知,构成薄膜的大分子由-CF-、-CF2-和-CF3等组分组成。随着氩气压强的增加,缺氟基团-C-增加,而-CF2-、-CF3等富氟基团以及F/C均减少;随着氮气偏压的增加,-CF-、-CF2-和-CF3以及F/C和N/C增加。同时探讨了溅射气氛对薄膜表面形貌、疏水性能及表面能的影响。更多还原

【Abstract】 Fluorocarbon polymer films are prepared by radio-frequency （RF） magnetron sputtering of polytetrafluoroethylene （PTFE）. The paper shows that the surface composition and chemical structure of the films vary with altering the argon and nitrogen gas pressure. X-ray photoelectron spectroscopy （XPS） measurements show that the as-deposited films reveal the C1s spectra containing peaks -CF-,-CF₂- and -CF₃ bonding, etc. With increasing of Argon pressure, the content of -C- units increases while the concentration of -CF₂-, -CF₃ and ratio of F/C etc decrease. The contents of -CF-, -CF₂-, -CF₃ groups, F/C and N/C increase with the increasing of nitrogen partial pressure. The effect of gas pressure on the surface morphology, hydrophobic properties and surface energy of as-deposited films is also discussed.更多还原