【摘要】 研究了一种新颖的基于MEMS工艺中离子束刻蚀的纳米沟道制备技术,通过研究离子束刻蚀微米级线条时,离子束刻蚀角度与刻蚀的轮廓形状之间的关系,在2μm线条内刻蚀出纳米沟道所需要的掩模图形,并结合KOH的各向异性腐蚀,成功获得了纳米沟道阵列。在两种不同的离子束刻蚀条件下,在2μm图形内分别制备出单纳米沟道和双纳米沟道,最小宽度可达440nm.更多还原

【Abstract】 We present a novel fabrication technique of nanogroove using conventional ion-beam etching process. The relation between the incident angle of etching ion beam and the obtained profile has been carefully investigated. Starting from 2 μm width features, we formed desired self-aligned nano scale opens by using specially designed ion-beam etching process, and then fabricated the triangular nanogroove arrays with KOH anisotropic etching. In the original 2 μm features, single and double nanogroove arrays can be easily achieved, whose width is as small as 440 nm and can be possibly extend to even narrower by precise time controlling.更多还原