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离子辅助制备凹印耐磨层工艺研究
Preparation and Processing of Wearable Layer of Gravure Printing by Ion Beam Assisted Deposition on Ni Substrates
【摘要】 针对凹印版电镀存在的污染和高能耗,采用射频感应偶合(ICP)离子源辅助电子束沉积技术在凹印镍版表面沉积了硬铬薄膜,通过控制离子源参数和加入过渡层来提高薄膜的与基体的结合力和显微硬度。研究了不同工艺条件制备薄膜的组织结构和性能,并与工厂实用的电镀样品做了对比。结果表明,优化工艺条件下的膜层,其硬度较高,表面均匀,与基体结合良好,可以达到甚至超过电镀样品;离子辅助和过渡层起着重要的作用。
【Abstract】 Hard Cr coatings on Ni and Cu surface were deposited by means of ion beam assisted deposition(IBAD) for the replacement of electroplated chromium so as to avoid the problems of pollution and hydrogen embrittlement.The morphologies and mechanical properties of the coatings were examined using SEM,AFM,optical metallographic microscopy,micro-hardness tester,scratch tester,and profile meter.The influences from processes on the performance of coatings are presented.Some results were analyzed and compared with that of the electroplated coatings.The results showed that it is feasible to obtain fine Cr wear-resistant coatings on Ni surface with optimized process.Ion bombardment and gradient layers play important roles for the coatings during their depositions.
【Key words】 ion assisted electron beam PVD; wear-resistant coating; gravure printing;
- 【文献出处】 包装工程 ,Packaging Engineering , 编辑部邮箱 ,2006年05期
- 【分类号】TS83
- 【下载频次】80